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August 1, 2013

A faster way to monitor particle contamination

The ADPC 302 (photo) is a unique, in-process contamination management system for particle contamination monitoring in the semiconductor industry. The system measures the number of particles in wafer-transport carriers, and its fully automated, patented process localizes and counts particles from the carrier surfaces, including the door. The dry process of the ADPC is said to have clear benefits compared to the traditional wet methods used in liquid particle counters. The test time is just 7 min — four times faster than traditional systems, says the company. — Pfeiffer Vacuum GmbH, Aßlar, Germany

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