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September 1, 2013

Chemical vapor deposition made easy

Chemical vapor deposition (CVD) is among the most reliable methods to produce large-area graphene films on different metal substrates with diverse carbon sources. The benchtop Thermal CVD Cube (photo) grows a bilayer graphene (BG) using a thermoplastic polymer as a solid carbon source. The system allows the operator to sequentially program each reaction step through its CVD Express software at ease. Additional features include: precise, configurable mass-flow control and realtime-readings-monitored experiments; one-zone furnace temperatures of 1,000°C; resistance heating and constant-temperature reaction zone; and safety alarms. The CVD Cube is said to be the most compact thermal CVD reactor on the market. — Oerlikon Leybold Vacuum, Cologne, Germany

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