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A new dry-vacuum pump for semiconductor processes

| By Chemical Engineering

Edwards

Last month’s launch of the iXL 120 (photo) expands this firm’s range of dry pumps for use in semiconductor manufacturing processes. Designed for load lock and other clean applications, the iXL 120 provides the fastest pumpdown in its class and low energy consumption for high throughput and low cost of ownership, says the firm. With a peak pumping speed of 110 m3/h, the iXL 120 is 22% faster than any other pump with a 20-L chamber. The average energy consumption is only 550 W — one of the lowest in its class. Unlike most competing dry pumps, the iXL 120 incorporates oil-lubricated precision bearings and timing gears, which reduces vibrations during operation. The new pump also features a zero nitrogen purge option for processes that do not use corrosive gases. This option eliminates the need to provide N2 to the pump, thereby simplifying operation and reducing operating costs. — Edwards, Crawley, U.K.

www.edwardsvacuum.com