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Linde starts up air-separation plant at Shanghai Huali Microelectronics

By Mary Page Bailey |

Linde (Guildford, U.K.; www.linde.com) announced it has started up a new air separation plant to supply nitrogen, high purity oxygen and argon to the 12-in. wafer product line of Shanghai Huali Microelectronics Corporation (HLMC) in Shanghai. In addition, Linde will supply hydrogen and helium to HLMC.

The new plant includes on-site nitrogen generators and a compressed dry air (CDA) system. The compact and energy efficient nitrogen generator has been specially designed by Linde to meet the increasing demands of electronics and semiconductor customers for higher purity industrial gas products.

“Recently, China’s electronics industry has significantly advanced in technology, innovation and production capabilities, and the reliable supply of high-quality gases is crucial to the success of our customers,” said Will Li, Head of Linde Greater China. “At the same time, our customers are keen to ensure that their operations are as sustainable and energy efficient as possible and are seeking solutions which help them address this challenge. We are proud to be a trusted partner for leading semiconductor companies like HLMC and we look forward to expanding our relationship in the future as we continue to build our network density in China.”

“The start-up of the plant marks yet another milestone in our successful collaboration with Linde which spans many years. Linde’s reliable supply, safe operations and technological innovation gives us full confidence,” said Mr. Lei Haibo, President of HLMC. “We look forward to strengthening our relationship with Linde in the future phases of our project.”

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