I D
× COMMENTARYCOVER STORYIN THE NEWSNEWSFRONTSCHEMENTATOR + Show More
Chementator Briefs
Ultrathin membrane Researchers led by professors Hideto Matsuyama and Tomohisa…
BUSINESS NEWSTECHNICAL & PRACTICALFEATURE REPORTFACTS AT YOUR FINGERTIPSTECHNOLOGY PROFILEEQUIPMENT & SERVICESFOCUS
Focus on Sensors
Wireless transmitters save on level sensor installation Reduce the cost…
NEW PRODUCTS + Show More SHOW PREVIEWS

Comment

Shin-Etsu enters license agreement with Qromis for gallium nitride technology

By Mary Page Bailey |

Shin-Etsu Chemical Co. (Tokyo; www.shinetsu.co.jp), announced that it has concluded a licensing agreement with Qromis, Inc. (Santa Clara, Calif.) regarding the patented technology Qromis possesses in the field of gallium nitride (GaN) processing, as Shin-Etsu aggressively moves ahead with its development of GaN-related products.

Shin-Etsu Chemical, together with its subsidiary Shin-Etsu Handotai Co., Ltd., which manufactures semiconductor silicon wafers, has been developing and selling substrates such as SOI (Silicon on Insulator) wafers and GaN on Silicon wafers besides its usual line of silicon wafers for power and high-frequency semiconductors.

Shin-Etsu will further expand its product portfolio by utilizing Qromis’ patented substrate technology in addition to advancing the line-up of its existing products, and will address a wide range of customer needs by offering multiple materials and substrates solutions.

The GaN market is expected to grow at a high rate in the future because these devices can significantly help to resolve the conflicting issues of the need for energy conservation and the high-performance requirements essential for mobility evolution in such areas as autonomous driving, 5G communication and deeper digitalization.

Related Content

Chemical Engineering publishes FREE eletters that bring our original content to our readers in an easily accessible email format about once a week.
Subscribe Now
Improving chemical production processes with IIoT and AI technologies
New filtration technology for highly corrosive media
PTA production: Lowering OPEX without compromising on quality
Sure that zero means zero in your zero-liquid discharge (ZLD) process?
How separation processes profit from Industrial Internet of Things (IIoT) solutions

View More

Live chat by BoldChat