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Comment Business & Economics

TEL and Edwards to develop new abatement solution

By Gerald Ondrey |

Edwards (Crawley, U.K.; www.edwardsvacuum.com) today announced that it will jointly develop a perfluorocarbon (PFC) gas-abatement system with Tokyo Electron Limited (TEL; www.tel.com) — the PA-01E for etch equipment. The new gas abatement system will be available mid-year 2009. The PA-01E system will help to reduce PFC pollution resulting from the dielectric film etching processes used in semiconductor manufacturing. It will be equipped with a plasma abatement device, collectively developed with Adtec Plasma Technology Co., Ltd., (Hiroshima, Japan), which offers a high transformation rate and stable operation. It is also designed to have a significantly lower cost-of-ownership due to its reduced requirement for energy, consumables and maintenance. In addition, the PA-01E system will be designed to abate carbon monoxide in addition to PFCs, eliminating the need for additional abatement hardware.
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