Source: Pfeiffer
The COMBI WVD vacuum booster pump unit features high pumping speed and low ultimate pressure, from atmosphere down to the 10-3 hPa (mbar) range. This makes it ideal for both standalone operation and use as backing pump for high vacuum pumps, such as turbomolecular vacuum pumps. The COMBI WVD pump unit is the successor to this company’s CombiLine WD. COMBI WVD vacuum booster pump units are particularly ideal for vacuum coating or drying applications and are also well suited for use in metallurgy, Research & Development, and other industries. They are available with various configurations of PANDA vacuum boosters and DuoVane rotary vane vacuum pumps. To ensure optimal adaptability, customized configuration options are supported, as well as a variety of accessories, including control units for the vacuum booster and the rotary-vane vacuum pump, oil-mist separators, gas-ballast valve kits and spare parts. The COMBI WVD series ensures reliable vacuum generation, making it also well suited for applications in R&D or the chemical and pharmaceutical industries. This is made possible by the contact-free operation of the PANDA vacuum boosters in the process chamber. In addition, certain configurations can utilize optional magnetic couplings for both vacuum pump and booster, eliminating the need for conventional shaft seals. This design also minimizes maintenance needs and contributes to overall cost efficiency. Additionally, the PANDA vacuum booster is equipped with an integrated bypass valve that protects the vacuum pump unit against overloading and overheating, enhancing the reliability and safety of the COMBI WVD. — Pfeiffer Vacuum GmbH, Asslar, Germany